Business Wire

Applied Materials Extends Copper/Low k Leadership with Innovative CMP Technology; Reflexion LK CMP System Planarizes Delicate Low k Interconnects at High Production Speeds

SANTA CLARA, Calif.--(BUSINESS WIRE)--June 25, 2003--Applied Materials, Inc. (Nasdaq:AMAT) announces Reflexion(R) LK, the industry's only low down force, high throughput CMP (chemical mechanical ...
Business Wire

Applied Materials Revolutionizes Planarization Technology with Breakthrough Reflexion LK Ecmp System

SANTA CLARA, Calif.--(BUSINESS WIRE)--July 12, 2004--Applied Materials, Inc. (Nasdaq:AMAT) today announces a major breakthrough in planarization technology with its revolutionary 300mm Applied ...
CIOL

Applied Materials takes CMP process control to 45nm and beyond

SANTA CLARA, USA: Applied Materials Inc. announced its new Applied FullVision System that enables real-time control of dielectric CMP1 processes to the 45nm device node and beyond. The FullVision ...
EDN

Applied Materials CMP announcement offers insights into 20-nm timing variations

Applied Materials' announcement this week of a newapplication for its Reflexion GT chemical-mechanical polishing (CMP) system mayseem an arcane detail to engineers outside the process-integration ...