ChEmpower Introduces Chakra™, the Industry’s First Functional Pad for Abrasive-Free Planarization

Today, ChEmpower, a leader in semiconductor process innovation, announced Chakra™, a family of functional polishing pads, beginning with the Copper Series, designed specifically for abrasive-free ...

ChEmpower debuts polishing technology to advance semiconductor manufacturing process

ChEmpower Corp., a semiconductor materials company that develops polishing pads and chemical solutions, today announced Chakra, its first product designed to improve efficiency, reduce costs and ...
Seeking Alpha

Qnity and SK hynix Sign Long-Term CMP Pad Supply Agreement

WILMINGTON, Del., Oct. 16, 2025 /PRNewswire/ -- Qnity, DuPont (DD)'s Electronics business, a premier technology solutions leader across the semiconductor value chain, today announced the signing of a ...
Digi Times

Fujifilm expands CMP slurry and post-CMP cleaner production to target advanced processes

Fujifilm is rapidly expanding its production of semiconductor materials in Kyushu, Japan. In addition to increasing the production capacity of chemical mechanical polishing (CMP) slurries at its ...
C&EN

ChEmpower raises $18.7 million for microchip polishing tech

The electronic chemical start-up ChEmpower has raised $18.7 million in a series A funding round to advance its abrasive-free system for polishing and planarizing silicon wafers during semiconductor ...
SDxCentral

Fujifilm starts production of CMP slurries in Japan, for chip manufacturing

Japanese conglomerate Fujifilm has opened a new facility for the production of Chemical Mechanical Polishing (CMP) slurries, a basic material used in semiconductor manufacturing process. CMP slurries ...