Focused ion beam (FIB) nanofabrication has emerged as a pivotal technique in the manipulation and customisation of materials at the nanoscale. This approach utilises a finely focused beam of ions to ...
Extreme ultraviolet (EUV) lithography exposed resist patterns can exhibit excessive line edge roughness (LER) and line width roughness (LWR) due to random or shot noise. Increasing the EUV exposure ...
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